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Analysis of Synergy Between Nanda Optoelectronic's Silicon Precursor Materials and Photoresist Business

#semiconductor_materials #business_synergy #photoresist #precursor #import_substitution #chip_materials #tech_sector #growth_potential
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January 19, 2026

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Based on the collected information and data, I will provide you with a systematic analysis of the synergy between Nanda Optoelectronic’s silicon precursor materials and photoresist business.


Analysis of Synergy Between Nanda Optoelectronic’s Silicon Precursor Materials and Photoresist Business
I. Overview of the Company’s Business Structure

According to the latest financial data, Nanda Optoelectronic (300346.SZ)'s first-half 2025 revenue structure presents a “three pillars” pattern:

Business Segment Revenue Share Gross Margin Business Positioning
Electronic Special Gases 60.1% 46.13% Core Pillar Business
Precursor Materials 27.8% 39.9% High-Growth Potential Business
Photoresist and Supporting Materials ~12% Strategic Layout Business

Nanda Optoelectronic Business Structure

The company is the only domestic semiconductor material enterprise with mass production capabilities for both

advanced precursor materials
and
high-end photoresists
. This “dual-wheel drive” model is unique among domestic semiconductor material enterprises [0][1].


II. Analysis of Silicon Precursor Materials Business
1. Product Layout and Technological Advantages

Nanda Optoelectronic’s silicon precursor business has achieved

full product category coverage
, including:

  • Metal Precursors
    : Trimethylgallium (TMGa), Trimethylindium (TMIn), Trimethylaluminum (TMA), Triethylgallium (TEGa)
  • Silicon Precursors
    : A variety of new silicon-based precursor products
  • High-k Materials
    : High-k trimethylaluminum (used for advanced process gate dielectrics)

In 2023, the company mass-produced

two world-first silicon precursor patented products acquired from DuPont
, marking a major breakthrough in the field of precursors for advanced processes [1]. In 2023, the company’s advanced semiconductor precursor sales exceeded RMB 100 million for the first time, becoming the main growth driver for its performance.

2. Market Size and Competitive Position
Indicator Data
Precursor Materials Sales Volume (2024) 208.92 tons (YoY growth of 62.22%)
Precursor Business Revenue (2024) RMB 340 million (YoY growth of 17.86%)
Capacity Utilization Rate (1H2025) 93.15% (Tight Supply)
Global Market Share of MO Sources (2019) Ranked No. 1 Globally

Nanda Optoelectronic is one of the world’s leading MO source manufacturers. Its products not only realize domestic import substitution but also are exported to Europe, America, and the Asia-Pacific region [1].


III. Analysis of Photoresist Business
1. Technological Breakthroughs and Mass Production Progress

Nanda Optoelectronic’s photoresist business is mainly carried out by its holding subsidiary

Ningbo Nanda Optoelectronic
:

  • ArF Photoresist
    : The company is the first domestic manufacturer to pass customer verification for ArF photoresist [1]
  • Capacity Layout
    : A 25-ton annual production line for ArF photoresist has been completed (a 50-ton annual production line will be completed in 2025)
  • Sales Performance
    : In 2024, sales of ArF photoresist exceeded RMB 10 million, and continuous stable supply has been maintained in 2025
2. Technology Route Coverage

Nanda Optoelectronic’s technological layout in the photoresist field includes:

  • Dry ArF photoresist
  • Immersion ArF photoresist (used for advanced processes of 28nm and below)
  • Multiple KrF photoresists under development

The company undertakes the National 02 Special Projects: “Key Technology R&D Project for High-Resolution Photoresist and Advanced Packaging Photoresist Products” and “ArF Photoresist Development and Industrialization Project”, and is a leading domestic enterprise in R&D and industrialization of ArF photoresist [1].


IV. Analysis of Synergy Between Silicon Precursors and Photoresist
1. Synergy in Process Flow

In semiconductor manufacturing, precursor materials and photoresist form a

core process chain of “Deposition - Lithography - Etching”
:

Semiconductor Manufacturing Process Flow

Process Step Materials Used Synergy Mechanism
Thin Film Deposition Silicon Precursors (ALD/CVD) Forms various functional thin film layers
Photoresist Coating Photoresist Carrier for pattern transfer
Exposure and Development Photoresist Precise pattern transfer
Etching Hard mask generated from precursors Transfers pattern to thin film
2. Technological Synergy

(1) Common Requirements for Advanced Processes

As process nodes evolve to 28nm, 14nm and below,

both precursors and photoresist face the same technological challenges
:

  • Multi-Patterning Technology
    : During the transition from DUV lithography to EUV lithography, ALD precursors are required to cooperate with photoresist to achieve self-aligned double patterning (SADP)
  • Ultra-Thin Film Layer Control
    : Advanced processes require atomic-level thin film thickness control (a core advantage of ALD technology)
  • High Purity Requirements
    : Both require purity control at the ppt level [2]

(2) Complementarity of Material Systems

Nanda Optoelectronic has simultaneous layouts in:

  • Silicon Precursors
    : Used to form functional thin films such as SiO₂, Si₃N₄, SiOCN
  • Photoresist
    : Photosensitive resin material used for pattern transfer

These two materials form a

complementary material system
in advanced packaging and logic chip manufacturing, enabling the company to provide customers with
comprehensive material solutions
[2][3].

3. Customer Resource Synergy

According to the company’s announcement, photoresist and supporting materials, as well as ALD/CVD precursor products, are all applied to

large-scale integrated circuit chip manufacturing
, and the customer groups are
highly homologous
[1].

Customer Type Potential Customers
Wafer Foundries SMIC, Hua Hong Semiconductor, Yangtze Memory Technologies
LED Chip Manufacturers Sanan Optoelectronics, HC SemiTek, etc.
Advanced Packaging Enterprises JCET, Tongfu Microelectronics, etc.

Synergy Advantages Manifested in
:

  • Once precursor products enter a customer’s supply chain, they can provide
    channel reuse
    for the introduction of photoresist products
  • The technical verification of the two products can
    mutually validate
    each other, enhancing customer trust
  • The procurement of two types of products by the same customer helps form a
    one-stop service
    advantage
4. R&D Synergy
Synergy Dimension Specific Performance
Technical Talents The semiconductor material R&D team can cover both precursors and photoresist
R&D Investment In 2021, the company’s R&D expense ratio reached 20.11%, forming technological accumulation [1]
Equipment Sharing Some analytical and testing equipment can be shared, reducing R&D costs
Patent Layout Constructs a patent barrier through the acquisition of DuPont’s silicon precursor patents

V. Strategic Value of Business Synergy
1. Market Size and Growth Potential
Material Type Global Market Size (2024) Domestic Substitution Space
Semiconductor Precursors Approximately USD 3 billion Localization rate less than 10%
Photoresist Approximately USD 10 billion Localization rate of high-end ArF/KrF <5%

The combined market size of the two is huge, and both are in the

critical window period for domestic substitution
[1][2].

2. Gross Margin and Profitability Synergy
Business Segment Gross Margin Level Synergy Effect
Precursor Materials 39.9% High technological barriers, strong profitability
Photoresist ~50% (industry average) High-margin business, expected to enhance overall profitability after mass production
Electronic Special Gases 46.13% Stable cash flow supports R&D investment

The high gross margin characteristic of the precursor business (maintained at around 50% for years) effectively boosts the company’s overall profitability. Once the photoresist business scales up, it will form a

dual profit engine
[1].

3. Capacity Layout Synergy
Capacity Project Expected Capacity Status
Industrialization Project of 45 Tons/Year Semiconductor Precursors for Advanced Processes 45 tons Completed
ArF Photoresist Production Line 50 tons/year To be completed in 2025
Ulan Qab Nanda Microelectronics (NF₃/WF₆) 7200 tons/500 tons Under construction

The synergistic layout of capacity helps the company form

scale effects
and reduce unit costs [1].


VI. Risks and Challenges
1. Long Customer Introduction Cycle
  • Photoresist Business
    : High stickiness between downstream integrated circuit manufacturing enterprises and upstream photoresist manufacturers, resulting in high customer barriers
  • Precursor Business
    : It takes at least five years from product R&D to mass production
2. Pressure of Technological Iteration
  • Both precursors and photoresist require
    R&D matching the product and technological iteration of clients
  • Advanced processes have continuously increasing requirements for material performance, leading to great pressure of technological update
3. Fierce International Competition
  • The precursor market is dominated by international giants such as Merck, Air Products, and Linde
  • The photoresist market has long been monopolized by Japanese companies such as JSR, Shin-Etsu Chemical, and Tokyo Ohka Kogyo

VII. Investment Value Assessment
Core Competitive Advantages
  1. Scarcity
    : The only domestic enterprise with mass production of both precursors and ArF photoresist
  2. Technological Barriers
    : Undertakes National 02 Special Projects and owns independent intellectual property rights
  3. Customer Resources
    : Products have been supplied to leading customers such as SMIC and Yangtze Memory Technologies
  4. Growth Space
    : Precursor sales exceed RMB 100 million, and the photoresist business has just entered the scaling-up phase
Key Tracking Indicators
Indicator Focus Area
Revenue Growth Rate of Precursor Business YoY growth of 17.86% in 2024, whether high growth can be sustained
Photoresist Order Status Sales exceeded RMB 10 million in 2024, what is the growth rate in 2025
Capacity Utilization Rate 93.15% capacity utilization rate of precursors in 1H2025, whether it remains saturated
Change in Gross Margin 39.9% gross margin of precursors, whether it is affected by price competition

VIII. Conclusion

Nanda Optoelectronic’s silicon precursor materials and photoresist business have

multi-dimensional synergies
:

  1. Process Synergy
    : Forms a complete process chain of “Deposition - Lithography - Etching”
  2. Customer Synergy
    : Shares semiconductor manufacturing customer resources, reducing introduction costs
  3. Technological Synergy
    : Advanced processes put forward common technical requirements for the two materials
  4. Strategic Synergy
    : Forms a “dual-wheel drive” business layout, enhancing risk resistance

This synergistic layout gives Nanda Optoelectronic a

unique competitive position
among domestic semiconductor material enterprises, and it is expected to fully benefit from the wave of domestic substitution of semiconductor materials. It is recommended to focus on the order breakthrough progress of the company’s photoresist business and the capacity release rhythm of the precursor business.


References

[0] Jinling API - Company Profile and Financial Data of Nanda Optoelectronic (300346.SZ)

[1] Futu News - “Domestic Photoresist, Who Will Laugh Last?” (https://news.futunn.com/post/66459902)

[2] GF Securities - In-Depth Research Report of ZenFan Tech (688596.SH) (https://pdf.dfcfw.com/pdf/H3_AP202309151598504756_1.pdf)

[3] Jishulink - “Core Process of Chip Manufacturing: Understand Thin Film Deposition in One Article” (https://www.jishulink.com/post/1877926)

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Insights are generated using AI models and historical data for informational purposes only. They do not constitute investment advice or recommendations. Past performance is not indicative of future results.